Dear JD, We are close to mastery of 2nm EUV lithography; the use of Extreme Ultraviolet (EUV) light with a wavelength of 13.5 nm to pattern silicon
Posted by
JD (aka Jason Dean)
May 31 '23, 14:45
|
silicon wafers for computer chips with feature sizes of 2nm. This technology is being developed as the next generation of lithography for the semiconductor industry to produce smaller and more advanced chips. The use of EUV light allows for greater precision in patterning and is expected to overcome some of the challenges posed by current lithography technologies. There are still technical hurdles to overcome in terms of the availability of light sources and resists to make 2nm EUV lithography a reality for mass production.
Would you consider a collaboration with us to solve the remaining challenges?
You can view our current reasearch at: https://qocit.edu.cn/
Ummm..sure? My extensive knowledge of all things Winona Ryder related and dad jokes ought to be the just the breakthrough you're looking for?
|